Name: Forno de revestimento CVD de carburo de silício para crescimento de epi de semicondutores
Uploaded: 2026-02-11CST00:06:47-06:00
Duration: 33 s
Description: Discover the HTCVD Silicon Carbide CVD SIC Epitaxy Growth Furnace, designed for high-performance semiconductor epi growth. Featuring multiple temperature control zones, this furnace ensures uniform coating and rapid deposition rates up to 50 microns per hour. Ideal for carbon-based and ceramic-based materials, it’s engineered for efficiency and precision in semiconductor manufacturing.

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Forno de revestimento CVD de carburo de silício para crescimento de epi de semicondutores

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November 05, 2024

Keyword: Máquina de revestimento do CVD

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Tag:

#Máquina de revestimento integrada do CVD #Vista - a máquina de revestimento resistente do CVD #Equipamento de revestimento do CVD das ferramentas de carboneto do CNC

Video Description:

Discover the HTCVD Silicon Carbide CVD SIC Epitaxy Growth Furnace, designed for high-performance semiconductor epi growth. Featuring multiple temperature control zones, this furnace ensures uniform coating and rapid deposition rates up to 50 microns per hour. Ideal for carbon-based and ceramic-based materials, it’s engineered for efficiency and precision in semiconductor manufacturing.

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